Differentiable Computational Lithogrpahy Framework

GDSHelpers is an open-source package for automatized pattern generation for nano-structuring.

Github repository to share some insights about lithography simulation.

From Qiskit Metal to pattern generation to real nanofabrication demo. Here, quantum devices on a chip are patterned via direct-write electron-beam lithography in a nanofabrication facility. Written & patterned by Onri Jay Benally, an Indigenous American quantum hardware engineer.

MATLAB tools for Raith electron-beam lithography (EBL) and focused ion beam (FIB) systems — Outils MATLAB pour les systèmes Raith de lithographie par faisceau d'électrons et de faisceau d'ions focalisés

We use MixedWM38, the mixed-type wafer defect pattern dataset for wafer defect pattern regcognition with visual transformers.

Generate ASCII Job files for an ASML PAS 5500 Stepper Lithography system, by the UCSB Nanofabrication Facility.

Practical example from the SPIE short course "Data Analytics and Machine Learning in Semiconductor Manufacturing: Applications for Physical Design, Process and Yield Optimization"

Maskless photolithography system targeting 5um resolution. Open hardware design.

Lithography defect prediction for microchip manufacturing optimization with machine learning model

MATLAB tools for Raith electron-beam lithography (EBL) and focused ion beam (FIB) systems — Outils MATLAB pour les systèmes Raith de lithographie par faisceau d'électrons et de faisceau d'ions focalisés

This is a comprehensive MATLAB-based software platform developed for real-time measurement and feedback control of a custom mask-projection photopolymerization based additive manufacturing system (referred as "ECPL", i.e., Exposure Controlled Projection Lithography) using a lab-built interferometry (referred as "ICM&M", i.e., Interferometric Cur…

Desktop app for lithography learning available for Windows, macOS, and Linux

EE6601 Advanced Wafer Processing

[WIP] MCSC - A semiconductor manufacturing mod for Minecraft (Java)

Software used to write conductive nanostructures at the interface of LaAlO3 and SrTiO3

A C# library for reading, editing, and writing Calma GDSII files.

Lithography Equipment Emulator

Vector graphics based nanolithography tool for Asylum Research AFMs